Laser photolysis of trimethoxysilane: chemical vapour deposition of nanostructured silicone powders with SiH and SiOCH 3  bonds | Zendy

Tomovská Radmila | Zendy; Bastl Zdenĕk | Zendy; Bohác̆ek Jaroslav | Zendy; Pola Josef | Zendy

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Laser photolysis of trimethoxysilane: chemical vapour deposition of nanostructured silicone powders with SiH and SiOCH 3 bonds

Author(s) -

Tomovská Radmila,

Bastl Zdenĕk,

Bohác̆ek Jaroslav,

Pola Josef

Publication year - 2003

Publication title -

applied organometallic chemistry

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.53

H-Index - 71

eISSN - 1099-0739

pISSN - 0268-2605

DOI - 10.1002/aoc.397

Subject(s) - chemistry , photodissociation , silicone , methanol , chemical vapor deposition , carbon monoxide , deposition (geology) , laser , photochemistry , chemical engineering , organic chemistry , catalysis , optics , sediment , biology , engineering , paleontology , physics

Gas‐phase photolysis of trimethoxysilane, achieved for the first time by focused ArF laser radiation at 193 nm, yields C 1,2 hydrocarbons, methanol and carbon monoxide along with ultrafine nanostructured silicone powder possessing SiO 3 and SiO 4 configurations and SiH and SiOCH 3 bonds. The photolytic process, resulting in efficient removal of the methyl groups, is explained as a multitude of steps involving cleavages of all the available bonds. Copyright © 2003 John Wiley & Sons, Ltd.

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