Premium
Preparation and properties of polyhedral oligomeric silsesquioxane polymers
Author(s) -
Shioda Takahiro,
Gunji Takahiro,
Abe Noritaka,
Abe Yoshimoto
Publication year - 2011
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/aoc.1820
Subject(s) - silsesquioxane , coating , curing (chemistry) , chemistry , polymer , polymer chemistry , chemical engineering , condensation , sol gel , spin coating , silica gel , organic chemistry , physics , engineering , thermodynamics
Polyhedral oligomeric silsesquioxane (POSS) polymers were synthesized by the dehydrogenative condensation of (HSiO 3/2 ) 8 with water in the presence of diethylhydroxylamine followed by trimethylsilylation. Coating films were prepared by spin‐coating of the coating solution prepared by the dehydrogenative condensation of POSS. The hardness of the coating films was evaluated using a pencil‐hardness test and was found to increase up to 8H with increases in the curing temperature. Free‐standing film and silica gel powder were prepared by aging the coating solution at room temperature. The silica gel powder was subjected to heat treatment under air atmosphere to show a specific surface area of 440 m 2 g −1 at 100 °C, which showed a maximum at 400 °C as 550 m 2 g −1 . Copyright © 2011 John Wiley & Sons, Ltd.