AACVD of WO 3  thin films from W(O)(OPr  i  ) 3 [O(CH 2 )  n  NMe 2 ] ( n  = 2, 3) | Zendy

Molloy K. C. | Zendy; Williams P. A. | Zendy

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AACVD of WO 3 thin films from W(O)(OPr i ) 3 [O(CH 2 ) n NMe 2 ] ( n = 2, 3)

Author(s) -

Molloy K. C.,

Williams P. A.

Publication year - 2008

Publication title -

applied organometallic chemistry

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.53

H-Index - 71

eISSN - 1099-0739

pISSN - 0268-2605

DOI - 10.1002/aoc.1458

Subject(s) - chemistry , chemical vapor deposition , tungsten , thin film , analytical chemistry (journal) , x ray crystallography , diffraction , crystallography , nanotechnology , optics , organic chemistry , materials science , physics

Monomeric tungsten oxo‐aminoalkoxides W(O)(OPr i ) 3 (L) [L = O(CH 2 ) n NMe 2 ; n = 2 (dmae, 1) and 3 (dmap, 2 )] were synthesized by alcohol exchange with [W(O)(OPr i ) 4 ] 2 and characterized spectroscopically. 1, 2 and [W(O)(OPr i ) 4 ] 2 were used as precursors for the aerosol‐assisted chemical vapour deposition of WO 3 thin films, which were characterized by glancing angle X‐ray diffraction, SEM and transmission‐reflectance measurements. Copyright © 2008 John Wiley & Sons, Ltd.

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