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Chemical vapor deposition of metal borides: 6. The formation of neodymium boride thin film materials from polyhedral boron clusters and metal halides by chemical vapor deposition
Author(s) -
Kher Shreyas S.,
Romero Jennifer V.,
Caruso John D.,
Spencer James T.
Publication year - 2008
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/aoc.1383
Subject(s) - chemistry , chemical vapor deposition , thin film , scanning electron microscope , boron , crystallite , analytical chemistry (journal) , neodymium , decaborane , inorganic chemistry , crystallography , organic chemistry , nanotechnology , materials science , composite material , laser , physics , optics
The chemical vapor deposition (CVD) of crystalline thin films of neodymium hexaboride (NdB 6 ) was achieved using either nido ‐pentaborane(9) or nido ‐decaborane(14) with neodymium(III) chloride on different substrates. The highly crystalline NdB 6 films were formed at relatively moderate temperatures (835 °C, ca. 1 µm/h) and were characterized by scanning electron microscopy, X‐ray emission spectroscopy, X‐ray diffraction and glow discharge mass spectrometry. The NdB 6 polycrystalline films were found to be pure and uniform in composition in the bulk material. Depositions using CoCl 2 , NdCl 3 and B 5 H 9 as the CVD precursors resulted in the formation of a mixture of NdB 6 and CoB phases, rather than the ternary phase. Copyright © 2008 John Wiley & Sons, Ltd.