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Silica dissolution as a route to octaanionic silsesquioxanes
Author(s) -
Kang K. H.,
Laine R. M.
Publication year - 2006
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/aoc.1071
Subject(s) - chemistry , dissolution , fumed silica , surface modification , chemical engineering , base (topology) , amorphous solid , polymer chemistry , organic chemistry , mathematical analysis , mathematics , engineering
The octaanion, [OSiO 1.5 ] 8 8− (OA) is a low cost, discrete nano silica particle that can be made directly from high surface area, amorphous silica reacted with Me 4 NOH in water alcohol mixtures. It would be ideal if Me 4 NOH could be formed in situ from, for example, Me 4 NCl and NaOH, as long known in the literature. This process would reduce costs and enable recycling of Me 4 NCl produced in the functionalization of OA with chlorosilanes, RMe 2 SiCl, to form [RMe 2 SiOSiO 1.5 ] 8 organic/inorganic hybrid nanobuilding blocks. Kinetic studies were conducted to assess base‐promoted dissolution of fumed silica (25 m2/g) as a function of concentrations, times, etc., to form the octaanion [OSiO 1.5 ] 8 8− using Me 4 NOH, NaOH and mixtures of NaOH/Me 4 NCl. Surprisingly, we find that small amounts of Me 4 NCl greatly inhibit the dissolution reaction for reasons that are as yet unknown. Copyright © 2005 John Wiley & Sons, Ltd.