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Chemical Vapor Deposition of Phase‐Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors
Author(s) -
Straub Mark D.,
Leduc Jennifer,
Frank Michael,
Raauf Aida,
Lohrey Trevor D.,
Minasian Stefan G.,
Mathur Sanjay,
Arnold John
Publication year - 2019
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201901924
Subject(s) - uranium , homoleptic , chemical vapor deposition , thin film , alkene , deposition (geology) , materials science , phase (matter) , uranium dioxide , chemistry , chemical engineering , inorganic chemistry , organic chemistry , catalysis , nanotechnology , metal , metallurgy , paleontology , engineering , sediment , biology
Homoleptic uranium(IV) amidate complexes have been synthesized and applied as single‐source molecular precursors for the chemical vapor deposition of UO 2 thin films. These precursors decompose by alkene elimination to give highly crystalline phase‐pure UO 2 films with an unusual branched heterostructure.