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Atomic Layer Deposition of the Metal Pyrites FeS 2 , CoS 2 , and NiS 2
Author(s) -
Guo Zheng,
Wang Xinwei
Publication year - 2018
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201803092
Subject(s) - atomic layer deposition , pyrite , cobalt , sulfur , stoichiometry , deposition (geology) , nickel , limiting , metal , materials science , layer (electronics) , nanotechnology , chemistry , inorganic chemistry , chemical engineering , metallurgy , geology , mechanical engineering , paleontology , sediment , engineering
Atomic layer deposition (ALD) of the pyrite‐type metal disulfides FeS 2 , CoS 2 , and NiS 2 is reported for the first time. The deposition processes use iron, cobalt, and nickel amidinate compounds as the corresponding metal precursors and the H 2 S plasma as the sulfur source. All the processes are demonstrated to follow ideal self‐limiting ALD growth behavior to produce fairly pure, smooth, well‐crystallized, stoichiometric pyrite FeS 2 , CoS 2 , and NiS 2 films. By these processes, the FeS 2 , CoS 2 , and NiS 2 films can also be uniformly and conformally deposited into deep narrow trenches with aspect ratios as high as 10:1, which thereby highlights the broad and promising applicability of these ALD processes for conformal film coatings on complex high‐aspect‐ratio 3D architectures in general.