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Atomic Layer Deposition of Iron Sulfide and Its Application as a Catalyst in the Hydrogenation of Azobenzenes
Author(s) -
Shao Youdong,
Guo Zheng,
Li Hao,
Su Yantao,
Wang Xinwei
Publication year - 2017
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201700449
Subject(s) - atomic layer deposition , catalysis , nanostructure , deposition (geology) , limiting , sulfide , materials science , iron sulfide , chemical engineering , porosity , layer (electronics) , thin film , nanotechnology , nanoscopic scale , selectivity , inorganic chemistry , chemistry , organic chemistry , metallurgy , sulfur , composite material , mechanical engineering , paleontology , sediment , engineering , biology
The atomic layer deposition (ALD) of iron sulfide (FeS x ) is reported for the first time. The deposition process employs bis( N , N′ ‐di‐tert‐butylacetamidinato)iron(II) and H 2 S as the reactants and produces fairly pure, smooth, and well‐crystallized FeS x thin films following an ideal self‐limiting ALD growth behavior. The FeS x films can be uniformly and conformally deposited into deep narrow trenches with aspect ratios as high as 10:1, which highlights the broad applicability of this ALD process for engineering the surface of complex 3D nanostructures in general. Highly uniform nanoscale FeS x coatings on porous γ‐Al 2 O 3 powder were also prepared. This compound shows excellent catalytic activity and selectivity in the hydrogenation of azo compounds under mild reaction conditions, demonstrating the promise of ALD FeS x as a catalyst for organic reactions.