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Oxide‐Nanotrap‐Anchored Platinum Nanoparticles with High Activity and Sintering Resistance by Area‐Selective Atomic Layer Deposition
Author(s) -
Liu Xiao,
Zhu Qianqian,
Lang Yun,
Cao Kun,
Chu Shengqi,
Shan Bin,
Chen Rong
Publication year - 2017
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201611559
Subject(s) - sintering , calcination , atomic layer deposition , catalysis , oxide , metal , materials science , chemical engineering , platinum , nanoparticle , thermal stability , deposition (geology) , layer (electronics) , inorganic chemistry , nanotechnology , chemistry , metallurgy , organic chemistry , paleontology , sediment , engineering , biology
An area‐selective atomic layer deposition (AS‐ALD) method is described to construct oxide nanotraps to anchor Pt nanoparticles (NPs) on Al 2 O 3 supports. The as‐synthesized catalysts have exhibited outstanding room‐temperature CO oxidation activity, with a significantly lowered apparent activation energy (ca. 22.17 kJ mol −1 ) that is half that of pure Pt catalyst with the same loading. Furthermore, the structure shows excellent sintering resistance with the high catalytic activity retention up to 600 °C calcination. The key feature of the oxide nanotraps lies in its ability to anchor Pt NPs via strong metal–oxide interactions while still leaving active metal facets exposed. Our reported method for forming such oxide structure with nanotraps shows great potential for the simultaneous enhancement of thermal stability and activity of precious metal NPs.