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Reversible Silylene Insertion Reactions into Si−H and P−H σ‐Bonds at Room Temperature
Author(s) -
Rodriguez Ricardo,
Contie Yohan,
Nougué Raphael,
Baceiredo Antoine,
SaffonMerceron Nathalie,
Sotiropoulos JeanMarc,
Kato Tsuyoshi
Publication year - 2016
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201606728
Subject(s) - silylene , silanes , reductive elimination , phosphine , silicon , chemistry , oxidative addition , photochemistry , catalysis , organic chemistry , silane
Abstract Phosphine‐stabilized silylenes react with silanes and a phosphine by silylene insertion into E−H σ‐bonds (E=Si,P) at room temperature to give the corresponding silanes. Of special interest, the process occurs reversibly at room temperature. These results demonstrate that both the oxidative addition (typical reaction for transient silylenes) and the reductive elimination processes can proceed at the silicon center under mild reaction conditions. DFT calculations provide insight into the importance of the coordination of the silicon center to achieve the reductive elimination step.