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No More HF: Teflon‐Assisted Ultrafast Removal of Silica to Generate High‐Surface‐Area Mesostructured Carbon for Enhanced CO 2 Capture and Supercapacitor Performance
Author(s) -
Singh Dheeraj Kumar,
Krishna Katla Sai,
Harish Srinivasan,
Sampath Srinivasan,
Eswaramoorthy Muthusamy
Publication year - 2016
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201509054
Subject(s) - carbonization , materials science , supercapacitor , carbon fibers , adsorption , chemical engineering , etching (microfabrication) , specific surface area , bar (unit) , activated carbon , capacitance , nanotechnology , composite material , layer (electronics) , electrode , scanning electron microscope , chemistry , organic chemistry , catalysis , composite number , meteorology , engineering , physics
An innovative technique to obtain high‐surface‐area mesostructured carbon (2545 m 2 g −1 ) with significant microporosity uses Teflon as the silica template removal agent. This method not only shortens synthesis time by combining silica removal and carbonization in a single step, but also assists in ultrafast removal of the template (in 10 min) with complete elimination of toxic HF usage. The obtained carbon material (JNC‐1) displays excellent CO 2 capture ability (ca. 26.2 wt % at 0 °C under 0.88 bar CO 2 pressure), which is twice that of CMK‐3 obtained by the HF etching method (13.0 wt %). JNC‐1 demonstrated higher H 2 adsorption capacity (2.8 wt %) compared to CMK‐3 (1.2 wt %) at −196 °C under 1.0 bar H 2 pressure. The bimodal pore architecture of JNC‐1 led to superior supercapacitor performance, with a specific capacitance of 292 F g −1 and 182 F g −1 at a drain rate of 1 A g −1 and 50 A g −1 , respectively, in 1 m H 2 SO 4 compared to CMK‐3 and activated carbon.