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Radicals Are Required for Thiol Etching of Gold Particles
Author(s) -
Dreier Timothy A.,
Ackerson Christopher J.
Publication year - 2015
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201502934
Subject(s) - etching (microfabrication) , thiol , oxygen , radical , chemistry , photochemistry , oxidation process , inert , inert gas , inorganic chemistry , chemical engineering , organic chemistry , layer (electronics) , engineering
Etching of gold with an excess of thiol ligand is used in both synthesis and analysis of gold particles. Mechanistically, the process of etching gold with excess thiol is unclear. Previous studies have obliquely considered the role of oxygen in thiolate etching of gold. Herein, we show that oxygen or a radical initiator is a necessary component for efficient etching of gold by thiolates. Attenuation of the etching process by radical scavengers in the presence of oxygen, and the restoration of activity by radical initiators under inert atmosphere, strongly implicate the oxygen radical. These data led us to propose an atomistic mechanism in which the oxygen radical initiates the etching process.