Premium
Lithographic Deposition of Patterned Metal–Organic Framework Coatings Using a Photobase Generator
Author(s) -
Keitz Benjamin K.,
Yu Chung Jui,
Long Jeffrey R.,
Ameloot Rob
Publication year - 2014
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201400580
Subject(s) - materials science , lithography , nucleation , deposition (geology) , chemical deposition , substrate (aquarium) , nanotechnology , metal , generator (circuit theory) , chemical engineering , optoelectronics , metallurgy , chemistry , organic chemistry , paleontology , power (physics) , oceanography , physics , quantum mechanics , sediment , engineering , biology , geology
A photobase generator was used to induce metal–organic framework (MOF) nucleation upon UV irradiation. This method was further developed into a simple, one‐step method for depositing patterned MOF films. Furthermore, the ability of our method to coat a single substrate with MOF films having different chemical compositions is illustrated. The method is an important step towards integrating MOF deposition with existing lithographic techniques and the incorporation of these materials into sensors and other electronic devices.