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XeF 2 /Fluoride Acceptors as Versatile One‐Electron Oxidants
Author(s) -
Poleschner Helmut,
Seppelt Konrad
Publication year - 2013
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201307161
Subject(s) - chemistry , silylation , medicinal chemistry , lewis acids and bases , electron acceptor , fluoride , thianthrene , stereochemistry , organic chemistry , catalysis , inorganic chemistry
No phlogiston but xenon is released when XeF 2 /F − acceptors act as new one‐electron oxidants. F − acceptors are Lewis acids BF 3 , B(C 6 F 5 ) 3 , and Al{OC(CF 3 ) 3 } 3 , and silyl derivatives TfOSiMe 3 , Tf 2 NSiMe 3 , Me 3 Si + B(C 6 F 5 ) 4 − , and Me 3 Si + CHB 11 Cl 11 − . The anions BF 4 − , TfO − , Tf 2 N − , FB(C 6 F 5 ) 3 − , FAl{OC(CF 3 ) 3 } 3 − , B(C 6 F 5 ) 4 − , or CHB 11 Cl 11 − can be introduced into oxidation products of R 2 E 2 (E=S, Se, Te), [FeCp 2 ], [(FeCpS) 4 ], tetrathiafulvalene, thianthrene, and (2,4‐Br 2 C 6 H 3 ) 3 N.
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