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Inside Back Cover: Engineering Multimodal Localized Surface Plasmon Resonances in Silicon Nanowires (Angew. Chem. Int. Ed. 31/2013)
Author(s) -
Chou LiWei,
Filler Michael A.
Publication year - 2013
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201304865
Subject(s) - nanowire , silicon , materials science , plasmon , semiconductor , silicon nanowires , doping , cover (algebra) , nanotechnology , optoelectronics , surface plasmon , localized surface plasmon , mechanical engineering , engineering
Localized surface plasmon resonances are generated in doped silicon nanowires by the absorption of mid‐infrared light. In their Communication on page 8079 ff., M. A Filler and L.‐W. Chou report a method to incorporate multiple, axially aligned, doped regions along the length of individual silicon nanowires. Their approach promises new opportunities to use the world's most ubiquitous semiconductor for catalysis, molecular detection, and energy harvesting.