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Uniform Si‐CHA Zeolite Layers Formed by a Selective Sonication‐Assisted Deposition Method
Author(s) -
Kim Eunjoo,
Cai Wanxi,
Baik Hionsuck,
Choi Jungkyu
Publication year - 2013
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201301265
Discrimination against the majority : The broad size distribution of conventional near‐cubic Si‐CHA (all‐silica chabazite) zeolites impedes the formation of a close‐packed layer, which is critical for the manufacture of zeolite films by secondary growth. Although present in lower abundance, platelike Si‐CHA particles cosynthesized with near‐cubic particles were deposited selectively on an α‐Al 2 O 3 disk to form a uniform layer.

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