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An Unconventional Route to Hierarchically Ordered Block Copolymers on a Gradient Patterned Surface through Controlled Evaporative Self‐Assembly
Author(s) -
Byun Myunghwan,
Han Wei,
Li Bo,
Xin Xukai,
Lin Zhiqun
Publication year - 2013
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201208421
Subject(s) - materials science , copolymer , polymer , self assembly , perpendicular , substrate (aquarium) , nanotechnology , concentric , thin film , surface (topology) , composite material , geometry , oceanography , mathematics , geology
A chemically patterned surface was formed by controlled evaporative self‐assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self‐assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.