Electrochemical X‐ray Photolithography | Zendy

Eliseev Andrei A. | Zendy; Sapoletova Nina A. | Zendy; Snigireva Irina | Zendy; Snigirev Anatoly | Zendy; Napolskii Kirill S. | Zendy

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Electrochemical X‐ray Photolithography

Author(s) -

Eliseev Andrei A.,

Sapoletova Nina A.,

Snigireva Irina,

Snigirev Anatoly,

Napolskii Kirill S.

Publication year - 2012

Publication title -

angewandte chemie international edition

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 5.831

H-Index - 550

eISSN - 1521-3773

pISSN - 1433-7851

DOI - 10.1002/anie.201204801

Subject(s) - photolithography , lithography , nanotechnology , electrochemistry , grating , computer science , materials science , optoelectronics , physics , electrode , quantum mechanics

Best of both worlds : Electrochemical X‐ray photolithography combines the advantages of X‐ray photolithography with the versatility of electrochemical processing. A proof‐of‐concept was carried out by electrochemical deposition of nickel under coherent X‐ray illumination guided through a lithographic mask with a 4 micrometer pitch, resulting in formation of a nickel grating (see picture).

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