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Electrochemical X‐ray Photolithography
Author(s) -
Eliseev Andrei A.,
Sapoletova Nina A.,
Snigireva Irina,
Snigirev Anatoly,
Napolskii Kirill S.
Publication year - 2012
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201204801
Subject(s) - photolithography , lithography , nanotechnology , electrochemistry , grating , computer science , materials science , optoelectronics , physics , electrode , quantum mechanics
Best of both worlds : Electrochemical X‐ray photolithography combines the advantages of X‐ray photolithography with the versatility of electrochemical processing. A proof‐of‐concept was carried out by electrochemical deposition of nickel under coherent X‐ray illumination guided through a lithographic mask with a 4 micrometer pitch, resulting in formation of a nickel grating (see picture).