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Adsorbate Alignment in Surface Halogenation: Standing Up is Better than Lying Down
Author(s) -
Huang Kai,
McNab Iain R.,
Polanyi John C.,
Yang Jody S. Y.
Publication year - 2012
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201202772
Subject(s) - halogenation , bromine , silicon , atom (system on chip) , surface (topology) , thermal , chemistry , electron , lying , atomic physics , materials science , geometry , physics , organic chemistry , engineering , mathematics , quantum mechanics , meteorology , embedded system , medicine , radiology
Bromine atom transfer to a silicon surface as a function of physisorbed adsorbate alignment (see picture: left, vertical 1‐bromopentane; right, horizontal 1‐bromopentane) of 1‐bromopropane and 1‐bromopentane on Si(111)‐7×7 has been studied by STM. In both thermal and electron‐induced bromination reactions, the vertical alignment is more reactive.