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Chemical‐Assisted Thermal Disproportionation of Porous Silicon Monoxide into Silicon‐Based Multicomponent Systems
Author(s) -
Lee JungIn,
Lee Kyu Tae,
Cho Jaephil,
Kim Jeyoung,
Choi NamSoon,
Park Soojin
Publication year - 2012
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201108915
Subject(s) - silicon monoxide , materials science , porous silicon , disproportionation , isotropic etching , silicon , nanoporous , chemical engineering , porosity , etching (microfabrication) , annealing (glass) , thermal , nanoparticle , thermal oxidation , nanotechnology , optoelectronics , composite material , chemistry , catalysis , organic chemistry , physics , layer (electronics) , meteorology , engineering
Under the surface : Ag nanoparticles are deposited onto the surface of commercially available SiO particles, and subsequent chemical etching results in the formation of nanoporous SiO (see picture) without changing the chemical and physical properties of the original SiO. Moreover, chemical‐assisted thermal annealing produces a shape‐preserving Si‐based multicomponent system, which exhibits high‐performance electrochemical properties.