z-logo
Premium
Single‐Layer Semiconducting Nanosheets: High‐Yield Preparation and Device Fabrication
Author(s) -
Zeng Zhiyuan,
Yin Zongyou,
Huang Xiao,
Li Hai,
He Qiyuan,
Lu Gang,
Boey Freddy,
Zhang Hua
Publication year - 2011
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201106004
Subject(s) - fabrication , materials science , layer (electronics) , yield (engineering) , nanotechnology , graphene , nanomaterials , transistor , layer by layer , optoelectronics , thin film transistor , metallurgy , electrical engineering , engineering , medicine , alternative medicine , pathology , voltage
Properly piled up : Single‐layer 2D semiconducting nanomaterials of MoS 2 , WS 2 , TiS 2 , TaS 2 , ZrS 2 , and graphene were fabricated through an electrochemical lithiation process (see picture). The production of single‐layer MoS 2 was achieved in 92 % yield. A single‐layer MoS 2 ‐based thin‐film transistor was fabricated, which was used for sensing NO at a detection limit of 190 ppt.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom