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Cover Picture: The Role of Dissociative Electron Attachment in Focused Electron Beam Induced Processing: A Case Study on Cobalt Tricarbonyl Nitrosyl (Angew. Chem. Int. Ed. 40/2011)
Author(s) -
Engmann Sarah,
Stano Michal,
Matejčík Štefan,
Ingólfsson Oddur
Publication year - 2011
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201104739
Subject(s) - cobalt , electron , cathode ray , nanostructure , materials science , dissociative , metal , chemistry , photochemistry , atomic physics , nanotechnology , physics , inorganic chemistry , organic chemistry , psychology , quantum mechanics , psychiatry
Absolute cross‐sections for dissociative electron attachment (DEA) to the typical focused electron beam induced processing (FEBIP) precursor cobalt tricarbonyl nitrosyl are reported. Nanostructures written by FEBIP can potentially be smeared and contaminated by back‐scattered and secondary low‐energy electrons. In their Communication on page 9475 ff. Š. Matejčík, O. Ingólfsson, and co‐workers discuss the role of DEA to metal–organic compounds in FEBIP.