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Capture of NO by a Frustrated Lewis Pair: A New Type of Persistent N ‐Oxyl Radical
Author(s) -
Cardenas Allan Jay P.,
Culotta Brooks J.,
Warren Timothy H.,
Grimme Stefan,
Stute Annika,
Fröhlich Roland,
Kehr Gerald,
Erker Gerhard
Publication year - 2011
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201101622
Subject(s) - frustrated lewis pair , ethylbenzene , intramolecular force , chemistry , radical , reactivity (psychology) , atom (system on chip) , stereochemistry , abstraction , lewis acids and bases , medicinal chemistry , catalysis , organic chemistry , computer science , medicine , philosophy , alternative medicine , epistemology , pathology , embedded system
NO your pairs : The intramolecular frustrated Lewis pair (FLP) Mes 2 PCH 2 CH 2 B(C 6 F 5 ) 2 captures NO to give the novel N ‐oxyl radical P/B‐FLP‐NO . (see scheme). Coordination of NO to the FLP incites H‐atom abstraction reactivity with cyclohexene and ethylbenzene to give P/B‐FLP‐NOH and the O‐functionalized P/B‐FLP‐NOR species.