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Electrons as “Invisible Ink”: Fabrication of Nanostructures by Local Electron Beam Induced Activation of SiO x
Author(s) -
Walz MarieMadeleine,
Schirmer Michael,
Vollnhals Florian,
Lukasczyk Thomas,
Steinrück HansPeter,
Marbach Hubertus
Publication year - 2010
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201001308
Subject(s) - electron beam induced deposition , electron beam lithography , materials science , nanotechnology , lithography , nanostructure , scanning electron microscope , stencil lithography , electron , nanolithography , resist , focused ion beam , electron beam processing , fabrication , ion , optoelectronics , chemistry , scanning transmission electron microscopy , transmission electron microscopy , physics , composite material , medicine , alternative medicine , pathology , quantum mechanics , layer (electronics) , organic chemistry
Beam me up : A novel two‐step process allows iron nanostructures to be generated locally on SiO x /Si at 300 K. The surface is first locally activated by an electron beam. Then the activated structures are exposed to [Fe(CO) 5 ], which decomposes and grows autocatalytically to give pure Fe nanocrystals.
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