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Inside Cover: A Silyl Radical formed by Muonium Addition to a Silylene (Angew. Chem. Int. Ed. 16/2010)
Author(s) -
Mitra Amitabha,
Brodovitch JeanClaude,
Krempner Clemens,
Percival Paul W.,
Vyas Pooja,
West Robert
Publication year - 2010
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.201001222
Subject(s) - muonium , silylene , muon , hyperfine structure , cover (algebra) , adduct , chemistry , muon spin spectroscopy , silylation , radical , photochemistry , crystallography , physics , atomic physics , particle physics , silicon , organic chemistry , catalysis , mechanical engineering , engineering
Irradiation of the stable silylene N , N ′‐bis(2,6‐diisopropylphenyl)‐1,3‐diaza‐2‐silacyclopent‐4‐en‐2‐ylidene with muons produces a radical that R. West and co‐workers have identified, on the basis of its muon spin rotation spectrum, as the monomeric muonium adduct. As described in the Communication on page 2893 ff., the muon hyperfine constant is 931 MHz, which is by far the largest ever recorded for a free radical.