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Low‐Temperature ABC‐Type Atomic Layer Deposition: Synthesis of Highly Uniform Ultrafine Supported Metal Nanoparticles
Author(s) -
Lu Junling,
Stair Peter C.
Publication year - 2010
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200907168
Subject(s) - calcination , nanoparticle , atomic layer deposition , deposition (geology) , nanotechnology , metal , materials science , layer (electronics) , computer science , chemistry , metallurgy , catalysis , organic chemistry , geology , paleontology , sediment
Sheltered growth : A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).