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Silicon Compounds of Neon and Argon
Author(s) -
Roithová Jana,
Schröder Detlef
Publication year - 2009
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200903706
Subject(s) - dication , chemistry , neon , argon , silicon , reagent , molecule , covalent bond , ion , photochemistry , noble gas , computational chemistry , organic chemistry
Noblesse oblige : The SiF 3 2+ dication, a superelectrophilic reagent, enables the formation of noble gas–silicon compounds in thermal ion–molecule reactions. Bimolecular collisions of mass‐selected SiF 3 2+ dications with argon lead to the dication ArSiF 2 2+ with a covalent ArSi bond as the major product at thermal energies. An unambiguous signal for the NeSiF 2 2+ dication is also observed, but in much lower yields.
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