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Chemical Vapour Deposition. Precursors, Processes and Applications. Edited by Anthony C. Jones and Michael L. Hitchman.
Author(s) -
Malandrino Graziella
Publication year - 2009
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200903570
Subject(s) - environmental ethics , polymer science , chemical engineering , materials science , philosophy , engineering
Royal Society of Chemistry, Cambridge 2008. 600 pp., hardcover £ 199.95.—ISBN 978‐0854044658
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