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On‐Wafer Crystallization of Ultralow‐ κ Pure Silica Zeolite Films
Author(s) -
Liu Yan,
Lew Christopher M.,
Sun Minwei,
Cai Rui,
Wang Junlan,
Kloster Grant,
Boyanov Boyan,
Yan Yushan
Publication year - 2009
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200900461
Subject(s) - crystallization , wafer , zeolite , materials science , chemical engineering , hydrothermal circulation , surface roughness , striation , surface finish , mesoporous material , nanotechnology , composite material , chemistry , organic chemistry , engineering , catalysis
A higher goal : An on‐wafer crystallization process to prepare pure silica zeolite (PSZ) MEL‐type films that is superior to the previously used hydrothermal process is reported. These striation‐free MEL‐type films (right, see picture) outperform the traditional spin‐on films (left) in terms of the κ value, mechanical properties, surface roughness, mesopore size, and size distribution.