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A Reactive Oxide Overlayer on Rhodium Nanoparticles during CO Oxidation and Its Size Dependence Studied by In Situ Ambient‐Pressure X‐ray Photoelectron Spectroscopy
Author(s) -
Grass Michael E.,
Zhang Yawen,
Butcher Derek R.,
Park Jeong Y.,
Li Yimin,
Bluhm Hendrik,
Bratlie Kaitlin M.,
Zhang Tianfu,
Somorjai Gabor A.
Publication year - 2008
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200803574
Subject(s) - overlayer , x ray photoelectron spectroscopy , rhodium , nanoparticle , ambient pressure , oxide , synchrotron , in situ , oxidation state , chemistry , spectroscopy , photochemistry , materials science , nanotechnology , chemical engineering , analytical chemistry (journal) , catalysis , organic chemistry , optics , physics , meteorology , engineering , quantum mechanics
The smaller, the better : In situ synchrotron ambient pressure X‐ray photoelectron spectroscopy allows examination of the oxidation state of the surface of the rhodium nanoparticles (NPs) during CO oxidation in an O 2 atmosphere. 2 nm NPs oxidize to a larger extent than 7 nm NPs during reaction at 150–200 °C, which correlates with a fivefold increase in turnover frequency for the smaller nanoparticles.