A Reactive Oxide Overlayer on Rhodium Nanoparticles during CO Oxidation and Its Size Dependence Studied by In Situ Ambient‐Pressure X‐ray Photoelectron Spectroscopy | Zendy

Grass Michael E. | Zendy; Zhang Yawen | Zendy; Butcher Derek R. | Zendy; Park Jeong Y. | Zendy; Li Yimin | Zendy; Bluhm Hendrik | Zendy; Bratlie Kaitlin M. | Zendy; Zhang Tianfu | Zendy; Somorjai Gabor A. | Zendy

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A Reactive Oxide Overlayer on Rhodium Nanoparticles during CO Oxidation and Its Size Dependence Studied by In Situ Ambient‐Pressure X‐ray Photoelectron Spectroscopy

Author(s) -

Grass Michael E.,

Zhang Yawen,

Butcher Derek R.,

Park Jeong Y.,

Li Yimin,

Bluhm Hendrik,

Bratlie Kaitlin M.,

Zhang Tianfu,

Somorjai Gabor A.

Publication year - 2008

Publication title -

angewandte chemie international edition

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 5.831

H-Index - 550

eISSN - 1521-3773

pISSN - 1433-7851

DOI - 10.1002/anie.200803574

Subject(s) - overlayer , x ray photoelectron spectroscopy , rhodium , nanoparticle , ambient pressure , oxide , synchrotron , in situ , oxidation state , chemistry , spectroscopy , photochemistry , materials science , nanotechnology , chemical engineering , analytical chemistry (journal) , catalysis , organic chemistry , optics , physics , meteorology , engineering , quantum mechanics

The smaller, the better : In situ synchrotron ambient pressure X‐ray photoelectron spectroscopy allows examination of the oxidation state of the surface of the rhodium nanoparticles (NPs) during CO oxidation in an O 2 atmosphere. 2 nm NPs oxidize to a larger extent than 7 nm NPs during reaction at 150–200 °C, which correlates with a fivefold increase in turnover frequency for the smaller nanoparticles.

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