z-logo
Premium
Synthesis of Heterometallic Group 13 Nanoclusters and Inks for Oxide Thin‐Film Transistors
Author(s) -
Mensinger Zachary L.,
Gatlin Jason T.,
Meyers Stephen T.,
Zakharov Lev N.,
Keszler Douglas A.,
Johnson Darren W.
Publication year - 2008
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200803514
Subject(s) - nanoclusters , cluster (spacecraft) , transistor , nanotechnology , materials science , indium , oxide , computer science , optoelectronics , physics , metallurgy , computer network , quantum mechanics , voltage
Cluster's last stand : The hydrated gallium/indium nanocluster [Ga 7 In 6 (μ 3 ‐OH) 6 (μ‐OH) 18 (H 2 O) 24 (NO 3 ) 15 ] was prepared in a facile, high‐yielding synthesis. The use of a key nitroso‐containing organic compound as an additive allows for the isolation of multiple grams of the cluster. This larger‐scale synthesis facilitates use of the cluster as a single‐source precursor for effective thin‐film transistors.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom