Micrometer‐Scale Protein‐Resistance Gradients by Electron‐Beam Lithography | Zendy

Winkler Tobias | Zendy; Ballav Nirmalya | Zendy; Thomas Heidi | Zendy; Zharnikov Michael | Zendy; Terfort Andreas | Zendy

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Micrometer‐Scale Protein‐Resistance Gradients by Electron‐Beam Lithography

Author(s) -

Winkler Tobias,

Ballav Nirmalya,

Thomas Heidi,

Zharnikov Michael,

Terfort Andreas

Publication year - 2008

Publication title -

angewandte chemie international edition

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 5.831

H-Index - 550

eISSN - 1521-3773

pISSN - 1433-7851

DOI - 10.1002/anie.200800810

Subject(s) - micrometer , lithography , ethylene glycol , monolayer , electron beam lithography , nanotechnology , scale (ratio) , electron microscope , atomic force microscopy , electron , materials science , chemistry , optics , optoelectronics , resist , physics , layer (electronics) , organic chemistry , nuclear physics , quantum mechanics

Sticky slope : The irradiation‐promoted exchange reaction on monolayers using ethylene glycol terminated thiols as ligands provides a useful tool for the adjustment of the bioresistance of surfaces. In conjunction with electron‐beam lithography, micrometer‐scale gradients of protein adhesivity could be produced (see picture: AFM=atomic force microscopy).

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