Premium
Micrometer‐Scale Protein‐Resistance Gradients by Electron‐Beam Lithography
Author(s) -
Winkler Tobias,
Ballav Nirmalya,
Thomas Heidi,
Zharnikov Michael,
Terfort Andreas
Publication year - 2008
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200800810
Subject(s) - micrometer , lithography , ethylene glycol , monolayer , electron beam lithography , nanotechnology , scale (ratio) , electron microscope , atomic force microscopy , electron , materials science , chemistry , optics , optoelectronics , resist , physics , layer (electronics) , organic chemistry , nuclear physics , quantum mechanics
Sticky slope : The irradiation‐promoted exchange reaction on monolayers using ethylene glycol terminated thiols as ligands provides a useful tool for the adjustment of the bioresistance of surfaces. In conjunction with electron‐beam lithography, micrometer‐scale gradients of protein adhesivity could be produced (see picture: AFM=atomic force microscopy).