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Inside Cover: A Route to Three‐Dimensional Structures in a Microfluidic Device: Stop‐Flow Interference Lithography (Angew. Chem. Int. Ed. 47/2007)
Author(s) -
Jang JiHyun,
Dendukuri Dhananjay,
Hatton T. Alan,
Thomas Edwin L.,
Doyle Patrick S.
Publication year - 2007
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200790240
Subject(s) - microfluidics , interference lithography , lithography , nanotechnology , fabrication , materials science , interference (communication) , micrometer , cover (algebra) , flow (mathematics) , particle (ecology) , optoelectronics , optics , physics , engineering , electrical engineering , mechanical engineering , pathology , geology , mechanics , medicine , channel (broadcasting) , oceanography , alternative medicine
Stop‐flow interference lithography inside a poly(dimethylsiloxane) microfluidic device is described by E. L. Thomas, P. S. Doyle, and co‐workers in their Communication on page 9027 ff. This new route enables the fabrication of large numbers of three‐dimensionally patterned, mask‐defined, polymeric particles with sub‐micrometer features. A wide range of monomers can be used to create complex overall particle shapes that have designed interior architectures and porosities.