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Fluorocarbon Resist for High‐Speed Scanning Probe Lithography
Author(s) -
Rolandi Marco,
Suez Itai,
Scholl Andreas,
Fréchet Jean M. J.
Publication year - 2007
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200701496
Subject(s) - lithography , resist , nanoscopic scale , nanotechnology , amorphous solid , deposition (geology) , x ray photoelectron spectroscopy , materials science , fluorocarbon , analytical chemistry (journal) , optoelectronics , chemistry , chemical engineering , environmental chemistry , engineering , geology , crystallography , composite material , sediment , paleontology , layer (electronics)
Quick as a flash : High‐speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s −1 range. Features as small as 27 nm are fabricated on 100‐μm 2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.