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A Torsional Strain Mechanism To Tune Pitch in Supramolecular Helices
Author(s) -
Li Liangshi,
Jiang Hongzhou,
Messmore Benjamin W.,
Bull Steve R.,
Stupp Samuel I.
Publication year - 2007
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200701328
Subject(s) - materials science , strain (injury) , nanostructure , supramolecular chemistry , nanometre , helix (gastropod) , steric effects , mechanism (biology) , range (aeronautics) , turn (biochemistry) , nanotechnology , crystallography , composite material , chemistry , physics , nuclear magnetic resonance , stereochemistry , crystal structure , medicine , ecology , quantum mechanics , snail , biology
On the turn : Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).