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Self‐Assembly Meets Nanofabrication: Recent Developments in Microcontact Printing and Dip‐Pen Nanolithography
Author(s) -
Huck Wilhelm T. S.
Publication year - 2007
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200604819
Subject(s) - microcontact printing , nanolithography , nanotechnology , lithography , dip pen nanolithography , materials science , flexibility (engineering) , photolithography , optoelectronics , fabrication , medicine , statistics , alternative medicine , mathematics , pathology
Neat styles of writing: Recent reports on massively parallel dip‐pen nanolithography and further improvements in the resolution of microcontact printing signify that patterning self‐assembled monolayers on the submicrometer scale over large areas has now reached a level of sophistication that allows it to rival “hard” lithographic techniques, while retaining the flexibility of using the patterned substrates as a platform for further chemical modification.