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Surface Modification with Orthogonal Photosensitive Silanes for Sequential Chemical Lithography and Site‐Selective Particle Deposition
Author(s) -
del Campo Aránzazu,
Boos Diana,
Spiess Hans Wolfgang,
Jonas Ulrich
Publication year - 2005
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200500092
Subject(s) - silane , monolayer , silanes , lithography , adsorption , benzoin , particle (ecology) , deposition (geology) , materials science , nanotechnology , chemical engineering , chemistry , polymer chemistry , organic chemistry , optoelectronics , engineering , oceanography , geology , paleontology , sediment , biology
Monolayer lithography : The concept of orthogonal cleavage of photolabile protecting groups was demonstrated with self‐assembled silane layers on solid surfaces. Nitroveratryloxycarbonyl and benzoin derivatives can be addressed independently by light of different wavelengths to selectively liberate amino and carboxylic acid groups, respectively, in mixed silane layers. Specific colloid adsorption on such photopatterned surfaces was investigated.