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High‐Resolution Soft Lithography: Enabling Materials for Nanotechnologies
Author(s) -
Rolland Jason P.,
Hagberg Erik C.,
Denison Ginger M.,
Carter Kenneth R.,
De Simone Joseph M.
Publication year - 2004
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200461122
Subject(s) - lithography , materials science , soft lithography , resist , impression , elastomer , molding (decorative) , nanotechnology , resolution (logic) , mold , transfer printing , composite material , optoelectronics , fabrication , computer science , medicine , alternative medicine , pathology , layer (electronics) , artificial intelligence , world wide web
Making a good impression : Photocurable, liquid perfluoropolyethers (PFPEs) are ideal materials for high‐resolution (<100 nm) pattern transfer and imprint lithographic processes (see pictures). PFPEs possess attributes of both elastomers and rigid materials, exhibit a remarkably low surface energy, mold extremely small features with high fidelity, resist swelling by organic solvents, and endure repetitive molding procedures.