Premium
Cover Picture: The Evolution of Dip‐Pen Nanolithography (Angew. Chem. Int. Ed. 1/2004)
Author(s) -
Ginger David S.,
Zhang Hua,
Mirkin Chad A.
Publication year - 2003
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200390636
Subject(s) - nanolithography , dip pen nanolithography , cover (algebra) , nanotechnology , lithography , nanometre , atomic force microscopy , materials science , substrate (aquarium) , optoelectronics , engineering , fabrication , composite material , medicine , mechanical engineering , oceanography , alternative medicine , pathology , geology
Dip‐Pen Nanolithography makes possible rapid patterning of surfaces on the nanometer scale. The cover picture clearly shows the principles of this technique: the deposition of dye molecules from an atomic force microscopy tip onto a substrate. Feymans 1960 dictum on miniturization, shown in nanometer‐sized type in the background, is proving to be once again applicable. C. A. Mirkin et al. summarize in their Review on page 30 ff. the current status of dip‐pen lithography and predict possible future developments.