Covalently Attached Monolayers on Hydrogen‐Terminated Si(100): Extremely Mild Attachment by Visible Light | Zendy

Sun QiaoYu | Zendy; de Smet Louis C. P. M. | Zendy; van Lagen Barend | Zendy; Wright Andrew | Zendy; Zuilhof Han | Zendy; Sudhölter Ernst J. R. | Zendy

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Covalently Attached Monolayers on Hydrogen‐Terminated Si(100): Extremely Mild Attachment by Visible Light

Author(s) -

Sun QiaoYu,

de Smet Louis C. P. M.,

van Lagen Barend,

Wright Andrew,

Zuilhof Han,

Sudhölter Ernst J. R.

Publication year - 2004

Publication title -

angewandte chemie international edition

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 5.831

H-Index - 550

eISSN - 1521-3773

pISSN - 1433-7851

DOI - 10.1002/anie.200352137

Subject(s) - monolayer , x ray photoelectron spectroscopy , silicon , covalent bond , materials science , hydrogen , visible spectrum , photochemistry , analytical chemistry (journal) , optoelectronics , chemistry , nanotechnology , chemical engineering , organic chemistry , engineering

An extremely mild and practical method to attach organic monolayers on flat silicon surfaces by using visible light (447 nm; see scheme) was developed and the mechanism investigated. With high‐resolution angle‐resolved X‐ray photoelectron spectroscopy (ARXPS) depth profiles of the elements in the monolayer (≈2 nm thickness) were obtained.

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