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Covalently Attached Monolayers on Hydrogen‐Terminated Si(100): Extremely Mild Attachment by Visible Light
Author(s) -
Sun QiaoYu,
de Smet Louis C. P. M.,
van Lagen Barend,
Wright Andrew,
Zuilhof Han,
Sudhölter Ernst J. R.
Publication year - 2004
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/anie.200352137
Subject(s) - monolayer , x ray photoelectron spectroscopy , silicon , covalent bond , materials science , hydrogen , visible spectrum , photochemistry , analytical chemistry (journal) , optoelectronics , chemistry , nanotechnology , chemical engineering , organic chemistry , engineering
An extremely mild and practical method to attach organic monolayers on flat silicon surfaces by using visible light (447 nm; see scheme) was developed and the mechanism investigated. With high‐resolution angle‐resolved X‐ray photoelectron spectroscopy (ARXPS) depth profiles of the elements in the monolayer (≈2 nm thickness) were obtained.