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Book Review: Chemical Vapor Deposition. Principles and Applications. Edited by M. L. Hitchman and K. F. Jensen
Author(s) -
Fischer Roland A.
Publication year - 1994
Publication title -
angewandte chemie international edition in english
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 0570-0833
DOI - 10.1002/anie.199414031
Subject(s) - citation , library science , nanotechnology , polymer science , chemistry , computer science , materials science