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Organoelement Compounds with AlAl, GaGa, and InIn Bonds
Author(s) -
Uhl Werner
Publication year - 1993
Publication title -
angewandte chemie international edition in english
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 0570-0833
DOI - 10.1002/anie.199313861
Subject(s) - trimethylsilyl , halide , chemistry , oxidation state , indium , steric effects , alkali metal , aluminium , gallium , metal , inorganic chemistry , polymer chemistry , organic chemistry
In the attempt to synthesize compounds with aluminum in a low oxidation state and an AlAl bond, by the reduction of alkylaluminum halides with alkali metals, analogous to a Wurtz coupling, in general the deposition of elemental aluminum and the formation of the corresponding trialkylaluminum compounds is observed. Thus, tetrasubstituted dialuminum compounds R 2 AlAlR 2 , apart from a few poorly characterized examples, were for a long time considered part of an unverified class of substances. Only with the sterically very highly shielded tetrakis[bis(trimethylsilyl)methyl]dialuminum did we achieve the synthesis of the first completely characterized organoelement compound with unlimited stability, which shows aluminum in the oxidation state + II and has an AlAl bond. In the meantime, corresponding compounds for the elements gallium and indium have been obtained. With the simple access to tetrasubstituted dimetal compounds, a fascinating new research area has opened for preparative chemistry, in which the particular interest will naturally lie in the reactive properties of the metal‐metal bond.

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