Premium
β‐CoGa and ϵ‐NiIn Films from Organometallic Single‐Source Precursors: Ligand‐Control of the Film Composition
Author(s) -
Fischer Roland,
Scherer Wolfgang,
Kleine Matthias
Publication year - 1993
Publication title -
angewandte chemie international edition in english
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 0570-0833
DOI - 10.1002/anie.199307481
Subject(s) - intermetallic , microelectronics , chemical vapor deposition , pyrolysis , chemical engineering , materials science , deposition (geology) , ternary operation , composition (language) , thin film , chemistry , nanotechnology , metallurgy , organic chemistry , computer science , engineering , paleontology , linguistics , philosophy , alloy , sediment , biology , programming language
The chemical vapor deposition of binary materials from single‐source precursors is particularly advantageous when all the factors essential for the layering process are incorporated in the molecular structure of the precursor, and thus only pressure and temperature remain as regulating parameters. This concept is demonstrated with heterodinuclear complexes such as 1 , whose mild pyrolysis results in intermetallic films, which are of interest for microelectronic purposes.