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Photoselective Processes in Cyclooctasulfur Layers: Desorption versus Polymerization
Author(s) -
Geyer Jens,
Stülpnagel Heinrich,
Rademann Klaus
Publication year - 1992
Publication title -
angewandte chemie international edition in english
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 0570-0833
DOI - 10.1002/anie.199208741
Subject(s) - desorption , polymerization , adsorption , thermal desorption , thermal desorption spectroscopy , sulfur , chemistry , wavelength , analytical chemistry (journal) , photochemistry , materials science , chromatography , optoelectronics , polymer , organic chemistry
Since the desorption rate depends on the light intensity , a purely thermal desorption mechanism for a thin sulfur film at λ = 225 nm can be rejected. Nonthermal desorption of adsorbed cyclooctasulfur was hitherto unknown. By contrast, at λ = 328 and 382 nm only a small amount of light‐induced desorption was detected. Instead, polymerization of sulfur was observed at these wavelengths to significantly larger extent than at λ = 255 nm.