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Microporous Silica Films
Author(s) -
Maier Wilhelm F.,
Wiedorn Michael,
Schramm Herbert O.
Publication year - 1991
Publication title -
angewandte chemie international edition in english
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 0570-0833
DOI - 10.1002/anie.199115091
Subject(s) - microporous material , microelectronics , materials science , silicon dioxide , porosity , quartz , silicon , evaporation , zeolite , chemical engineering , nanotechnology , composite material , optoelectronics , chemistry , organic chemistry , engineering , physics , thermodynamics , catalysis
A narrow range of pore radii , pore diameters of 6 ± 2 Å, and a porosity of 14% characterize the silicon dioxide films which can be made by the electron beam evaporation of quartz. Thus they offer an alternative to zeolite films for the separation of liquids and gases, and applications in nonlinear optics and microelectronic sensors.

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