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Hexafluorophosphate of the Bis(naphthalene) Radical Cation
Author(s) -
Fritz Heniz P.,
Gebauer Helmut,
Friedrich Peter,
Schubert Ulrich
Publication year - 1978
Publication title -
angewandte chemie international edition in english
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 0570-0833
DOI - 10.1002/anie.197802751
Subject(s) - naphthalene , hexafluorophosphate , chemistry , stacking , salt (chemistry) , radical ion , medicinal chemistry , crystallography , photochemistry , ion , organic chemistry , ionic liquid , catalysis
Precise stacking of naphthalene units is found in the salt (C 10 H 8 ) 2 PF 6 which is generated electrochemically and contains the bis(naph‐thalene) radical cation. The spacing between the C 10 H 8 units (320pm) is the lowest yet found between arene rings and suggests pronounced interaction between the π‐systems.

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