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Athermal and Soft Multi‐Nanopatterning of Azopolymers: Phototunable Mechanical Properties
Author(s) -
Yang Bowen,
Cai Feng,
Huang Shuai,
Yu Haifeng
Publication year - 2020
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201914201
Subject(s) - nanoimprint lithography , materials science , fabrication , photolithography , nanotechnology , soft lithography , polymer , lithography , nanolithography , glass transition , optoelectronics , composite material , medicine , alternative medicine , pathology
Imprinting nanopatterns on flexible substrates has diverse applications in advanced fabrication. However, the traditional thermal nanoimprint lithography (T‐NIL) often causes shrinkage upon cooling. Here, a simple yet versatile method is introduced to fabricate multiple nanopatterns on a flexible substrate coated with an azopolymer by combining athermal nanoimprint lithography (AT‐NIL) and photolithography. The azopolymer has various mechanical properties upon photoirradiation: 1) phototunable glass‐transition temperatures ( T g ) and concomitantly photoinduced switch from glassy plastic to viscoplastic polymer; 2) prominent modulation of viscoplasticity under light illumination at different wavelengths. Regionally selective multiple nanopatterns are conveniently fabricated, presenting angle‐dependent structural color images on poly(ethylene terephthalate) (PET) substrates. The flexible, athermal and multiple nanopatterning method has the potential for on‐demand fabrication of complex nanopatterns.