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Large‐Area Synthesis of Superclean Graphene via Selective Etching of Amorphous Carbon with Carbon Dioxide
Author(s) -
Zhang Jincan,
Jia Kaicheng,
Lin Li,
Zhao Wei,
Quang Huy Ta,
Sun Luzhao,
Li Tianran,
Li Zhenzhu,
Liu Xiaoting,
Zheng Liming,
Xue Ruiwen,
Gao Jing,
Luo Zhengtang,
Rummeli Mark H.,
Yuan Qinghong,
Peng Hailin,
Liu Zhongfan
Publication year - 2019
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201905672
Subject(s) - graphene , materials science , chemical vapor deposition , nanotechnology , carbon fibers , etching (microfabrication) , oxidizing agent , amorphous carbon , graphene oxide paper , amorphous solid , graphene nanoribbons , chemical engineering , fabrication , graphene foam , chemistry , organic chemistry , composite material , composite number , medicine , alternative medicine , layer (electronics) , pathology , engineering
Contamination commonly observed on the graphene surface is detrimental to its excellent properties and strongly hinders its application. It is still a great challenge to produce large‐area clean graphene film in a low‐cost manner. Herein, we demonstrate a facile and scalable chemical vapor deposition approach to synthesize meter‐sized samples of superclean graphene with an average cleanness of 99 %, relying on the weak oxidizing ability of CO 2 to etch away the intrinsic contamination, i.e., amorphous carbon. Remarkably, the elimination of amorphous carbon enables a significant reduction of polymer residues in the transfer of graphene films and the fabrication of graphene‐based devices and promises strongly enhanced electrical and optical properties of graphene. The facile synthesis of large‐area superclean graphene would open the pathway for both fundamental research and industrial applications of graphene, where a clean surface is highly needed.