Chemical Vapor Deposition of Phase‐Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors | Zendy

Straub Mark D. | Zendy; Leduc Jennifer | Zendy; Frank Michael | Zendy; Raauf Aida | Zendy; Lohrey Trevor D. | Zendy; Minasian Stefan G. | Zendy; Mathur Sanjay | Zendy; Arnold John | Zendy

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Chemical Vapor Deposition of Phase‐Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors

Author(s) -

Straub Mark D.,

Leduc Jennifer,

Frank Michael,

Raauf Aida,

Lohrey Trevor D.,

Minasian Stefan G.,

Mathur Sanjay,

Arnold John

Publication year - 2019

Publication title -

angewandte chemie

Language(s) - English

Resource type - Journals

eISSN - 1521-3757

pISSN - 0044-8249

DOI - 10.1002/ange.201901924

Subject(s) - homoleptic , uranium , thin film , chemical vapor deposition , alkene , uranium dioxide , phase (matter) , chemistry , materials science , deposition (geology) , inorganic chemistry , chemical engineering , organic chemistry , nanotechnology , catalysis , metal , metallurgy , paleontology , engineering , sediment , biology

Homoleptic uranium(IV) amidate complexes have been synthesized and applied as single‐source molecular precursors for the chemical vapor deposition of UO 2 thin films. These precursors decompose by alkene elimination to give highly crystalline phase‐pure UO 2 films with an unusual branched heterostructure.

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