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Scalable Wet Deposition of Zeolite AEI with a High Degree of Preferred Crystal Orientation
Author(s) -
Huang PeiSun,
Lam Chon Hei,
Su ChienYou,
Chen YenRu,
Lee WenYa,
Wang DaMing,
Hua ChiChung,
Kang DunYen
Publication year - 2018
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201807430
Subject(s) - zeolite , materials science , wafer , chemical engineering , membrane , deposition (geology) , silicon , thin film , degree (music) , crystal (programming language) , porosity , nanotechnology , composite material , optoelectronics , chemistry , catalysis , organic chemistry , computer science , paleontology , biochemistry , physics , sediment , acoustics , engineering , biology , programming language
Producing zeolite films with controlled preferred orientation on an industrial scale is a long‐standing challenge. Herein we report on a scalable approach to the direct wet deposition of zeolite thin films and membranes while maintaining a high degree of control over the preferred crystal orientation. As a proof of concept, thin films comprising aluminophosphate zeolite AEI were cast on silicon wafer or porous alumina substrates. Electrical properties and separation performance of the zeolite thin films/membranes were engineered through controlling degree of preferred crystal orientation.